
【国际标准】 Gas analysis — Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration
本网站 发布时间:
2025-02-18
开通会员免费在线看70000余条国内标准,赠送文本下载次数,单本最低仅合13.3元!还可享标准出版进度查询、定制跟踪推送、标准查新等超多特权!  
查看详情>>

适用范围:
暂无
标准号:
ISO 12963:2017 EN
标准名称:
Gas analysis — Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration
英文名称:
Gas analysis — Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration标准状态:
现行-
发布日期:
2017-04-24 -
实施日期:
出版语种:
EN
- 其它标准
- 上一篇: ISO 12960:2020 EN e94ada71 Geotextiles and geotextile-related products — Screening test methods for determining the resistance to acid and alkaline liquids
- 下一篇: ISO 12963:2017/Amd 1:2020 EN 1a0c0379 Gas analysis — Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration — Amendment 1: Correction to Formula 5
- 推荐标准
- IEC TR 61832:2015 EN 008b6a54 Design and installation of on-line analyser systems - Guide to technical enquiry and bid evaluation
- IEC TR 62432:2006 EN 337b8c4f The rH index in aqueous and aqueous-organic media
- IEC TR 62434:2006 EN d4e6e1a0 pH measurements in difficult media - Definitions, standards and procedures
- ISO 11039:2012 EN fa61934d Surface chemical analysis — Scanning-probe microscopy — Measurement of drift rate
- ISO 11775:2015 EN 0d950b60 Surface chemical analysis — Scanning-probe microscopy — Determination of cantilever normal spring constants
- ISO 12406:2010 EN 8fbc4d49 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of arsenic in silicon
- ISO 13084:2018 EN a2bd2b44 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
- ISO 13095:2014 EN 79527b9c Surface Chemical Analysis — Atomic force microscopy — Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement
- ISO 14237:2010 EN ca31ac53 Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials
- ISO 14606:2022 EN 22e4f150 Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
- ISO 14706:2014 EN 99a932eb Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
- ISO 14707:2021 EN 7d4cf4be Surface chemical analysis — Glow discharge optical emission spectrometry (GD-OES) — Introduction to use
- ISO/TR 15969:2021 EN 535c5d25 Surface chemical analysis — Depth profiling — Measurement of sputtered depth
- ISO/TR 18392:2005 EN 754257ab Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for determining backgrounds
- ISO/TR 19319:2013 EN efc917b6 Surface chemical analysis — Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods