标准详细信息 去购物车结算

【国外标准】 Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS

本网站 发布时间: 2024-02-28
开通会员免费在线看70000余条国内标准,赠送文本下载次数,单本最低仅合13.3元!还可享标准出版进度查询、定制跟踪推送、标准查新等超多特权!   查看详情>>
标准简介标准简介

适用范围:

5.1 Although it would be desirable to measure the extent of profile distortion in any unknown sample by using a standard sample and this guide, measurements of interface width (profile distortion) can be unique to every sample composition (1, 2).4 This guide, describes a method that determines the unique width of a particular interface for the chosen set of operating conditions. It is intended to provide a method for checking on proper or consistent, or both, instrument performance. Periodic analysis of the same sample followed by a measurement of the interface width, in accordance with this guide, will provide these checks.5.2 The procedure described in this guide is adaptable to any layered sample with an interface between layers in which a nominated element is present in one layer and absent from the other. It has been shown that for SIMS in particular (3, 4) and for surface analysis in general (5, 6), only rigorous calibration methods can determine accurate interface widths. Such procedures are prohibitively time-consuming. Therefore the interface width measurement obtained using the procedure described in this guide may contain significant systematic error (7). Therefore, this measure of interface width may have no relation to similar measures made with other methods. However, this does not diminish its use as a check on proper or consistent instrument performance, or both.5.3 This guide can be used for both elemental and molecular depth profiles, provided that the materials have constant sputter rates throughout the depth of the overlayer, and minimal interlayer mixing is occurring. For more detailed information regarding measurements of interface widths during organic depth profiling, please see Mahoney (8).1.1 This guide provides the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens (both organic and inorganic). This guide does not apply to data obtained from analyses of specimens with thin markers or specimens without interfaces such as ion-implanted specimens.1.2 This guide does not describe methods for the optimization of interface width or the optimization of depth resolution.1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

基本信息

  • 标准号:

    ASTM E1438-11(2019)

  • 标准名称:

    Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS

  • 英文名称:

    Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
  • 标准状态:

    Active
  • 发布日期:

  • 实施日期:

  • 出版语种:

标准分类号

  • 标准ICS号:

    29.045
  • 中标分类号:

关联标准

  • 替代以下标准:

  • 被以下标准替代:

  • 引用标准:

  • 采用标准:

出版信息

  • 页数:

    3 页
  • 字数:

  • 开本:

其他信息

  • 起草人:

  • 起草单位:

  • 归口单位:

    E42.06
  • 提出部门:

  • 发布部门:

  • 推荐标准
Baidu
map