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【国际标准】 Interated circuits - Manufacturing line approval - Methodology for technology and failure analysis
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标准简介适用范围：
暂无
标准号：
IEC TS 61945:2000 EN-FR
标准名称：
Interated circuits - Manufacturing line approval - Methodology for technology and failure analysis
英文名称：
Interated circuits - Manufacturing line approval - Methodology for technology and failure analysis标准状态：
现行-
发布日期：
2000-03-10 -
实施日期：
出版语种：
EN-FR
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- IEC 60747-16-10:2004 EN_D 83ca3549 Semiconductor devices - Part 16-10: Technology Approval Schedule (TAS) for monolithic microwave integrated circuits
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- IEC 60748-20-1:1994 EN-FR 038ab678 Semiconductor devices - Integrated circuits - Part 20: Generic specification for film integrated circuits and hybrid film integrated circuits - Section 1: Requirements for internal visual examination
- IEC 60748-20:1988/AMD1:1995 EN-FR e2f88f62 Amendment 1 - Semiconductor devices. Integrated circuits. Part 20: Generic specification for film integrated circuits and hybrid film integrated circuits
- IEC 60748-21-1:1997 EN-FR 227a216d Semiconductor devices - Integrated circuits - Part 21-1: Blank detail specification for film integrated circuits and hybrid film integrated circuits on the basis of qualification approval procedures
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- IEC 60748-22:1997 EN-FR 7afc2dda Semiconductor devices - Integrated circuits - Part 22: Sectional specification for film integrated circuits and hybrid film integrated circuits on the basis of the capability approval procedures
